Liquid and gas contact apparatus



Patented ocr. 2o, 1942A LIQUID AND GAS CONTACT APPARATUS Gilbert D.-Dill, New York, N. Y., assignor to H. A.

Brassart & Company, Chicago, Ill., a corporation of mnois ApplicationJune 7, 1940, Serial No. 339,289

5 Claims.

r'i'his invention relates to anew and improved liquid and gas contactapparatus and more particularly to apparatus of this character in whichtemperatures may be adequately controlled and intimate contact andmixture of the gases and liquids'secured.

In the preferred form of construction, contact units are used of thetype disclosed in my prior Patent No. 2,088,691, but it will beunderstood that any generally similar types of contact units may be4used if desired. The apparatus provides means for use in various typesof processes for the absorption, fractionation, cooling or heating orother treatment of gases by means of liquids. The temperatures of theliquids may be accurately controlled at diierent stages of the processwhich involves repeated contacts lbetween gas and liquid in a pluralityof stages. The flow of liquid in each stage is concurrent with the flowof gas while the overall ow of liquids is countercurrent .to the gas ow.

It is an object of the present invention to provide apparatus' forproducing intimate contact between gases and liquids.

It is a further object to provide apparatus of this character having aplurality of contact stages with separate control of liquid temperature.

lt is an additional object to provide a construction in which the now ofgasA and liquid in individual stages is concurrent while the overallflow It is another object to provide apparatus in which the relativeratios between gas or vapor and liquid may be readily changed to adaptthe apparatus for luse in connection with various processes.

It is a further object to provide a construction in which the liquid ispumped from stage to stage and in which any desired portions of theliquid may be diverted or drawn off from the apparatus at variouspoints.

It is also an object to provide an apparatus which may be constructedhorizontally or vertitically as may be desired.

Other and further objects will appea; as the description proceeds.

I have shown certain preferred embodiments of my invention in theaccompanying drawing, in which- Figure 1 is a cross-section of avertical form of apparatus; and

Figure 2 is a similar section of a horizontal form of apparatus.

Referring llrst to lthe construction of Figur 1, the tower ll isvertical tower of the conventianal type used as a fractionating orcontact column.` This tower is provided with a plurality of transversedecks or partitions l2 to i9, inclusive. These decks are each providedwith a plurality of openings through which extend the gas and liquidcontacting means 20 of my prior patent above referred to. These decks l2to I9, inclusive, are each provided with a sump, numbered from 2l to 2S,inclusive. The input liquid main 29 leads to the pump 30 which forcesthe liquid under pressurethrough the header 3l to the units 2@ in deckBZ..

The otake pipe 32 leads from the sump 2i in deck l2 to a pump 33, andthe discharge pipe 3d of this pump passes the liquid to the heatexchanger unit 35. From the unit 35 the header 36 discharges to theunits 2@ in deck I3. Thev oitake pipe 3l leads from the sump Z2 in decki3 to pump 38. The discharge from pump 38 is to a heat exchanger 38leading to the header il@ connected to units 2@ in deck lil. Thedischarge from the pump `38 is also connected to an ofitake pipe t! bymeans of which a portion of the liquid may be drawn off in a sidestream.

The remainder of the tower is connected in the same manner, the liquidfrom sump-23 in deck it passing through pump t2 and heat exchanger es tothe units rnin deck as. The pump is handles the liquid owin'g from sump2li and passes it to a side discharge pipe 45 or to the heat exchangerfrom which it ows through the units 2@ in deck i6. Pump 4l handles theliquid from sump 25 and passes it through heat exchanger d@ to the units20 in deck ll. The sump 26 in deck il is connected to pump da whichdischarges to the side stream pipe 5@ and to the heat exchanger 5. Theheat exchanger 5l is connected to units 2Q in deck i8. The sump 2l indeck I8 is connected to pump 52, which feeds the liquid throughheatexchanger 53- to the units 20 in deck I9. The sump 28 in lower deck I9is connected to a U-shaped liquid seal pipe 54, the overilow dropping tothe bottom of the tower il from which it may be drawn off through pipe55. The gases or vapors to be treated by or mixed with the liquid areintroduced into the lower portion of the tower through pipe 56 and passoi from the top of the tower through pipe 51.

generally similar in construction and operation to that above described.This horizontal construction has many desirable features and may befound preferable to the vertical construction for the reason that it isless expensive to construct than the very high vertical tower, and alsomay be designed so as to be more readily serviced.

In the construction of Figure 2 the horizontal housing 68 is providedwith the gas or vapor intake pipe 6| at the left end and the dischargepipe 62 at the right end. The liquid from main 63 passes through pump 84to the header 65, discharging into the units 28 in the horizontal deck66. Liquid overflow from deck 68 passes to the lower right end of thechamber at 61, from which it is drawn oiI through pipe 68 to pump 69.The discharge from pump 68 is through the heat exchanger 18 and pipe 1|to the units 28 in deck 12. Decks 66 and 12 have their left endsconnected by vertical wall 18 extending to the top of the housing 88.The right ends of the decks 68 and 12 are connected by vertical wall 14which extends to the bottom of the housing 68.

The sump 15 in deck 12 is connected by pipe 16 to the pump 11 from:which lead the side stream pipe 18 and the pipe 18 which connects to theheat exchanger 88. The heat exchanger 88 is connected by pipe 8| to theunits 28 in deck 82. The overflow from deck 82 passes into the bottom ofthe housing of chamber A88 and is drawn off through pipe 88 by pump 84which discharges through heat exchanger 85 and pipe 86 to units 28 indeck 81. The sump 88 in deck 81 passes the liquid from that deck tothepipe 88 connected to pump 88. This pump 88 is connected to the sidestream pipe 8| and the heat exchanger 82. This heat exchanger 82 isconnected. by pipe 83 with the contact units 28 in deck i3d. Theoveriiow from deck 84 is drawn ou through pipe *J5 by pump 88 anddischarged through heat exchanger $31 to units 28 in deck 88. The inalstages in the entire unit are ccnnected in the same marmer, the sump t@handling the liquid from deck 8S, this liquid passing through pipe iti@to pump 2&3. This pump it discharges into the oitake pipe itl?. andthrough pipe M33 to the heat exchanger i851. The heat exchanger le@ isconnected through pipe 85 to units i2@ in deck 'il'he liquid flowingfrein deck it@ is drawn ei by wip "i andpassed by pump iii@ to excl`rfrom. which it is discharged thrcugh pipe it@ to units in deck iti. Theoverflow from deck tit 'passes to the iower portion ci the chamber belowthat deck through pipe H2, and is o@ from the entire unit through pipe03. The decks in suc seeding stages are mounted on vertical walls thesame manner as described in coection with decks and `2'these verticalwalls separating the entire contact unit into a plurality of chamberswhich counicate only through the contact units 28 extending through thedecks separating the chamicers.

lin operation ci either form of apparatus, it

-w'i'il be apparent that while the general iiow of 4 iiquid iscountercurrent to the now oi the gases er vapors being treated in theunit, the flow in each stage is concurrent with the vapor iiow.Referring to the construction of Figure l, the vapor or gas iow isupwardly through the tower and the ow of liquid in each contact unit 28is also upwardly. The `body of liquid used for contact purposes,-however, is introduced through units 28 in the uppermost deck l2 and theoverflow from that deckis carried downwardly to be again placed underpressure and forced through the units 28 in deck I3. This iiowprogresses in stages i1.' that should prove desirable in certain f usesof the apparatus.

The operation of the horizontal construction is simullar to that of thevertical. Here the main body of liquid is introduced in the right handend of the entire contact apparatus housing 68 and ultimately reachesthe left end to pass out through pipe H3, unless it is partiallywithdrawn through the intermediate offtakes 18, 8| and |82. The flow ofgases or vapors, however,

' is in the opposite direction and this vapor ilows steed that a greaterer less nuii'icer of dec progressively upwardly through to decks and|86, after which it flows downwardly to again come upwardly under andthrough deck 88, after which it passes through deck 84 and again passesdownwardly under deck`81. The flow continues in a similar manner throughthe remaining decks to the offtake passage'62.

It will be understood that in both forms of construction the liquidpassing upwardly from the nozzles through the .Venturi-like throat ofthe units 28, impinges against the deflector which is supported abovethe Venturi throat of each such unit. This deflector stops the upwardflow of the liquid and turns it and deects it to flow downwardly uponthe deck adjacent the upper Walls of the throat. The unit itself isfully disclosed in my prior patent and need notwbe iurther describedherein.

Due to the concurrent flow of liquid and gases or vapors through theseunits, there is substantially no pressure loss in the gas or vapor. rlheseries of pumps supply pressure to the liquids so that the gases orvapors are aspirated through the units 28 without effective loss ofpressure. The heat exchangers may be for the purpose ci raising orlowering the temperatures of the liquid iicws at diierent points inoperation, depending upon the nature of 'the process being carried outby use of the apparatus. it will be ci may 'ce used and that thestructures t ce proportihned according to the purpose for which they areused and according to the ratios ci gases and vapors which are passedthrough the units. While have shown certain preferred forms ofapparatus, they are to be understood to be by Way of example only, asthe construction may be varied within the spirit and scope of theappended claims. It is further to be understood thatY the term gases"when used herein is intended to include .any gases including air or anygaseous vapors with or without entrained solids or liquids in finelydivided form.

What is claimed is: l

l. Apparatus for providing intimate contact `.ietween liquids and gases,comprising a series of chambers separated by walls having openingstherein, nozzles directed through each of said openings, means forintroducing gas to one end of said series of chambers, means forwithdrawing gas from the opposite end of the series, means for supplyingliquid under pressure to said nozzles to form aspirating sprays throughsaid openings, and means for withdrawing the liquid from certain of saidchambers, for placing the withdrawn liquid under pressure and returningit to the nozzles spraying into an adjacent chamber.

2. Apparatus for providing intimate contact between liquids and gases,comprising a series of" chambers separated by walls having openingstherein, nozzles directed throughA each of said openings, means forintroducing gas to one end of said series of chambers, means forwithdrawing gas from the opposite end of the series, means for supplyingliquid under pressure to said nozzles to form aspirating sprays throughsaid openings, and means for withdrawing 'the liquid from certain ofsaid chambers for changing the temperature of said liquid and forplacing the withdrawn liquid under pressure and returning it to thenozzles spraying into an adjacent chamber.

3. Apparatus for providing intimate Contact between liquids and gases,-comprising a series of chambers, approximately horizontal wallsseparating the chambers, openings through said walls, spray nozzlesdirected through each of said openings, means 7for supplying liquid tosaid nozzles, means for withdrawing liquid from one chamber and forreturning at least a portion of said liquid under pressure to thenozzles discharging into an adjacent chamber, and means for introducinggas to be treated to one end of said series of chambers and forwithdrawing it from the same direction as the flow from the nozzles.

4. Apparatus for providing intimate contact the opposite end of theseries, the gas ilowing in 30 between liquids and gases comprising 'aseries of chambers, approximately horizontal walls separating thechambers, openings through said walls, spray nozzles directed throughsaid openings, means for supplying liquid to said nozzles, means forwithdrawing liquid from one chamber and for changing the temperature ofat least a portion of'the liquid and returning said portion underpressure to the nozzles discharging into an adjacent chamber, and meansfor introducing gas to be treated to one end of said series of vchambersand for withdrawing it from the opposite end of the series, the gasowing in the same direction as the ilow from the nozzles'.

5. Apparatus forv providing intimate contact between liquids and gases,comprising a series of chambers, approximately horizontal wallsseparating the chambers, openings through said walls, spray nozzlesdirected through said openings, means for supplying liquid to saidnozzles, means for withdrawing liquid from one chamber and for returningat least a portion of said liquid under pressure to the nozzlesdischarging into an adjacent chamber, and means for introducing gas tobe treated to one end of said series of chambers and for withdrawing itfrom the opposite end oi' the series, the gas ilowing in the samedirection as the ilow from the nozzles, and the progressive transfer ofliquid from one chamber to another being countercurrent to the gas iiowthrough the apparatus.

' GILBERT D. DILL.

